CEO,Toba Co., Ltd.
A Design of the AMBR Systems for Precision Control of Moving Webs
Ho Anh Duc Nguyen (1), Dongjun Shin (1), Jeongkee Eun (1), Jaeho Choi (1), Junhyuk Choi (1) and Kee-Hyun Shin (1,2*)
(1) Toba Co., Ltd., Seoul, Korea
(2) School of Mechanical Engineering, Konkuk University, Seoul Korea
R2R printing technique has gained significant attention for fabricating electronic devices such as OTFT, RFID tag, and flexible PCB due to its characteristics of high throughput and large area [1,2]. Because of the demand for device miniaturization leading to high speed operation and high level of integration, the high accuracy i.e. register error is crucial in both the x-axis (MD – machine direction e.g. ±10 µm) and y-axis (CMD – cross machine direction ±10 µm). While there have been a number of studies on register error control in the x-axis [3,4], there are few reports on controlling high accuracy of moving webs in the y-axis.
An AMBR (active motion based roller) system is suggested in this report for the control of the web position in the y-axis. The AMBR system is able to rotate around z-axis at a center point as we move the left and the right side of an active roller amount of X1 and X2 in xy-plane (X1=X2). The positioning of moving web obeys the normal entry law i.e. the web tracks laterally on roller surface until it is once again perpendicular to the roller axis . Therefore, the control of displacement X1 and X2 could be used to control precisely the position of the moving web. The schematic of an AMBR system is shown in Fig.1.
Here we design the AMBR system for controlling the moving web in the y-axis. First the mathematical model was suggested based on the beam model . The simulation analysis was implemented to define the operating range of the AMBR system. Finally, the performance of the AMBR system was verified by experimental results. Fig. 2 confirmed that the AMBR system could control the position of moving web in the y-axis within ±10 µm
 S. H. Lee, D. G. Lee, H. Jung, and S. Lee, Jpn J Appl Phys. 57, 05GC01 (2018).
 K. Shin, H. A. D. Nguyen, J. Park, D. Shin, D. Lee J Coat. Technol. Res. 14: 95 (2017).
 H. Kang, C. Lee, and K. Shin, J Process Contr. 20, 643-652, (2010)
 C. Kim, H. You, J. Jo (2013). Jpn J ppl Phys 52:05DB08 (2013)
 J. J. Shelton, PhD Thesis, Oklahoma State University, 1968
2011~2012 Chairman of IEC National Committee of Korea for TC 119
1992~ Prof. of Konkuk Univ.
2010~ Board member of OE-A LOPE-C
2009~ CEO of TOBA
2009~ Executive Vice President of KoPEA
2008~ Chair/Co-Chair of many Int. Conf. including ICFPE
2007~ Deputy Director of KU-VTT joint Research Institute
2006~2011 Director of e-Printing Cluster
2005~ Director of FDRC
2002~ Member of IEEE
Toba has been developing matching technology to define “E3 machine” for the manufacturing of printed electronics as shown in the figure below, For given specifications of a printed electronic device, Toba can define and manufacture necessary roll-to-roll( R2R) modules and systems which matche with parameters, web paths, printing/coating processes, substrates, and printing solution. Toba also provides consulting and analysis for existing R2R e-Printing systems and manufacturing of printed devices including flexible solar cell, sensor, and battery, touch screen, OLED light, flexible display etc. Major concepts of matching technology and some examples of implementation of matching logic in the multi-layer roll-ro-roll printing including a RLC circuit will be presented in our website. Let us match the world together in love and peace!